We have compiled a list of manufacturers, distributors, product information, reference prices, and rankings for Target Material.
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Target Material Product List and Ranking from 5 Manufacturers, Suppliers and Companies

Last Updated： Aggregation Period:Nov 26, 2025～Dec 23, 2025
This ranking is based on the number of page views on our site.

Target Material Manufacturer, Suppliers and Company Rankings

Last Updated： Aggregation Period:Nov 26, 2025～Dec 23, 2025
This ranking is based on the number of page views on our site.

  1. アローズ Kanagawa//Manufacturing and processing contract
  2. プロスタッフ Kanagawa//Industrial Machinery
  3. 福建省長汀金龍希土 希土金属事業部 China//Ferrous/Non-ferrous metals
  4. SPUTTERCORE CO.,LTD. Osaka//Electronic Components and Semiconductors
  5. エムアンドシー Tokyo//Ferrous/Non-ferrous metals
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Target Material Product ranking

Last Updated： Aggregation Period:Nov 26, 2025～Dec 23, 2025
This ranking is based on the number of page views on our site.

  1. Target material アローズ
  2. Target material "Sputtering Target" プロスタッフ
  3. Target material 福建省長汀金龍希土 希土金属事業部
  4. ITO (90:10; 95:5; 97:3...)Low-density ITO Target SPUTTERCORE CO.,LTD.
  5. Sputtering target material エムアンドシー

Target Material Product List

1～6 item / All 6 items

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Polycrystalline silicon (Si) target

Polycrystalline silicon (Si) target

Poly-Silicon target supplier, Poly-Si target manufacturer, Multicrystalline silicon target price Used as components in devices such as CVD equipment, annealing furnaces, and diffusion furnaces! Polycrystalline silicon materials suitable for applications requiring high purity and thermal properties!

■ Purity > 99.9999% ■ Density (2.33/cm³) ■ Manufacturing methods: Melting method and sintering method *For more details, please download the PDF or feel free to contact us.

  • Other polymer materials
  • Composite Materials

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Target material "Sputtering Target"

Target material "Sputtering Target"

A must-have item for thin film formation materials with a different level of high purity and high quality!

"Spattering targets" are high-quality thin film formation materials boasting high purity products ranging from 99.5% to 99.999%. Our company can manufacture various spattering targets that match your business needs. From selecting target materials to bonding processing and evaluation, you can leave everything related to spattering targets to us. [Features] ■ High purity products ranging from 99.5% to 99.999% ■ Alloy production is also possible for development purposes ■ Proven track record in manufacturing various types of spattering targets ■ Capable of responding to various requests *For more details, please refer to the PDF document or feel free to contact us.

  • others

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Target material

Target material

We respond to our customers' diverse needs, including target materials (rare earths)!

Our company, united as one, strives for production in accordance with the goal of "Creating a Bright Future for Tomorrow," responding to customer demands and producing reliable, high-quality rare earth products.

  • Rare metals
  • alloy
  • Non-ferrous metals

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Target material

Target material

We are actively engaged in joint development with our customers to improve product performance.

Our company specializes in proposing target materials that are essential for surface modification of sliding parts exposed to intense friction, as well as for mass production molds for advanced manufacturing processes, including carbide tools and production lines. Among these, we are particularly skilled in targets used in the PVD (Physical Vapor Deposition) method, and we support both arc ion plating and sputtering methods. Please feel free to contact us if you have any inquiries. 【Products We Excel In】 ■ Tungsten Carbide ■ Target Development ■ Anti-adhesion Plates ■ Targets for Low-E Glass *For more details, please download the PDF or feel free to contact us.

  • Other metal materials

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ITO (90:10; 95:5; 97:3...)Low-density ITO Target

ITO (90:10; 95:5; 97:3...)Low-density ITO Target

Oxides that can be used as transparent electrodes and to control pixels without compromising the visual information of the screen!

■ Each Ratios (90:10; 95:5; 97:3) ■ Manufacturing method: Powder metallurgy *For more details, please download the PDF or feel free to contact us.

  • Ceramics

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Sputtering target material

Sputtering target material

About sputtering target materials

We offer a variety of sputtering targets, including Cr, Ti, CrAl, WC, and many other materials. We can also accommodate different shapes and dimensions, such as round, plate, and rod shapes, according to our customers' needs. We look forward to your requests.

  • Sputtering Equipment

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